As the cost and complexity of semiconductor design and manufacturing rises, there is a greater emphasis than ever on the development of 'More than Moore' materials, devices and processes. Through this approach, new product innovation and functionality becomes possible for a wide range of organisations within the industry.
The aim of this workshop is to give an overview of the research status and potential of important new materials that are suitable for the development of low-dimensional devices and structures. These include materials such as GaN, Metal Oxides including ZnO, III-Vs and Graphene.
The aim is to give industry professionals a general overview of progress and opportunity, and to bring the academic and industrial communities together to better understand future material and device integration, manufacturing and product innovation challenges and opportunities.
- 9.30 Registration and Networking
- 10.00 Welcome Prof. Steve Hall, University of Liverpool
- 10.10 Support for Innovation in New Technologies Paul Huggett, ESP KTN and Dr. Alastair McGibbon, NMI
- 10.30 ALD Process Technologies for Low-Dimensional Devices Prof. Paul Chalker, University of Liverpool
- 11.00 III-V on Silicon Devices Prof. Iain Thayne, University of Glasgow
- 11.30 Innovative Epilayer and Multilayer Growth IQE
- 12.00 Fabricating Low-D devices for industrial applications Prof. Mo Missous, University of Manchester
- 12.30 Lunch, Networking and Poster Session
- 2.00 Transferring novel GaN Technologies to Manufacturing Dr. David Wallis, Plessey Semiconductor
- 2.30 Graphene and other 2-D devices Dr. Cecilia Mattevi, Imperial College, London
- 3.00 Metal Oxides and Large Area Electronics University of Cambridge
- 3.30 Close and tour of the Liverpool Facilities
This event is free to attend. Register here.